Facility †

[Fabrication system,experimental equipment]

• Micropowder blasting
  
  
• Galvano laser scan system
  
  
• Electric muffle furnance ： Yamato Scientific FO-310
  
  
• Mask aligner ： Canon PLA-501S
  
  
• Spray developer
  
  
• Compact developer ： Takizawa Sangyo AD-1200
  
  
• Spin coater ：　Oshigane SC-200
  
  
• Ion sputtering system ： JEOL JFC-1500
  
  
• Reactive Ion Etching ： ANELVA DEM-451
  
  
• Vacuum vapor deposition system： JEOL JEE-400
  
  
• Vacuum plasma system?： SAKIGAKE-Semiconductor YHS-R
  
  
• Draft chamber：N2FACTORY NGDS-2
  
  
• Draft chamber
  
  
• Photolithography Room (Clean room)
  
  
• High speed micro centrifuge：Kenis CF02
  
  
• Autoclave：AS ONE NCC-16LVB
  
  
• 3D printer： Micro M3D
  
  
• Polisher
  
  
• Router
  
  
• Aspirator
  
  
• Hotplate stirrer
  
  
• Hotplate
  
  
• Electric balance
  
  
• Ultrasonic cleaner
  
  
• Centrifuge
  
  
• Autoclave
  
  
• Deionized Water Production Unit： SHIBATA PURE PORT P-101
  
  
• Dry cabinet：SANPLATEC DGK-220C-A
  
  

[Analytical instruments]

• Scanning Electron Microscope ： Shimadzu Rika Corporation e-SEM
  
  
• Spectrophotometer ： Shimadzu Corporation UVmini-1240
  
  
• UV-Vis-Nir Spectrophotometer ： Shimadzu Corporation UV-3600i Plus
  
  
• Microplate reader ：Corona Electric SH-1300Lab
  
  
• X ray diffractometer：Rigaku MIniFlex600
  
  
• Confocal laser scanning microscope ： Keyence VK-8500
  
  
• Dynamic Light-Scattering Particle Size Analyzer ： Horiba SZ-100S
  
  
• Surface roughness measuring instrument ： Tokyo seimitsu Surfcom480A
  
  
• Transmission Electron Microscope ： Hitachi HT7800
  
  
• Tensile tester ： Imada MX-500N, ZTS-500N
  
  
• Microscope
  
  

[Computing cluster, Software]

• Parallel computer（Linux CentOS6.3） ： Dell T5600 4 units
  
  
• Analytical PC（Windows7) ： 3 units
  
  
• Analytical PC（Windows8) ： 4 units